SmartProbe

Technical Notes

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Technical Note 1: I-V Characteristic
A description of the features of the IV characteristic and how the analyses of the IV curve yield the main plasma parameters.
Technical Note 2: Zero Second Derivative
Analysis routine in SmartSoft software, based on simple probe theory.
Technical Note 3: Intersecting Slopes
Analysis routine in SmartSoft software, based on Laframbois probe theory.
Technical Note 4: Laframbois Theory
A detailed description of Laframbois theory, which takes into account the expansion of the plasma sheath as a function of probe bias.
Technical Note 5: Theoretical Curve
How the theoretical curve gives feedback on the validity and accuracy of the measured plasma parameters.
Technical Note 6: Electron Energy Distribution Function (EEDF)
A detailed description of how the EEDF is measured using numerical differentiation techniques.
Technical Note 7: High-Frequency Plasma Potential Sensor
Discussion of how the High-Frequency Plasma Potential sensor allows the probe to compensate for the oscillating RF field in the vicinity of the probe.
Technical Note 8: Low-Frequency Plasma Potential Sensor
A description of the unique reference probe that compensates for low frequency shifts in the plasma potential.
Technical Note 9: SmartClean
A description of how true automated probe tip cleaning is achieved through the SmartClean algorithm described in this tech note.
Technical Note 10: Time-Resolved Langmuir Probe Measurements
A description of how boxcar mode is used to obtain time resolved plasma parameters in both pulsed plasma sources and RF sources.

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