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SmartProbe Citations
Citations
Electron beams in asymmetric capacitively coupled radio frequency discharges at low pressures
J Schulze, BG Heil, D Luggenholscher, T … - J. Phys. D: Appl. Phys, 2008 - iop.org
... are performed in a pure krypton discharge at 1 Pa and 8 W. At these parameters Langmuir
probe measurements (Scientific Systems, Smart Probe) at the axial ...
Process monitoring during AlN deposition by reactive magnetron sputtering -
J Acosta, A Rojo, O Salas, J Oseguera –
Surface and Coatings Technology Volume 201, Issue 18, 25 June 2007, Pages 7992-7999 – Elsevier.
... Yvon HR640 spectrometer and the Langmuir measurements were performed with a Smart
probe automated Langmuir probe plasma diagnostic from Scientific Systems. ...
Study of a New Plasma Source for Free-Standing Plasmas
U Schweitzer, A Schulz, M Walker, U Schumacher, U …
- PLASMA PROCESSES AND POLYMERS, 2007 - Volume 4, Issue S1 , Pages S978 - S981 doi.wiley.com
... Electron densities and electron temperatures were measured with Langmuir probes
of the type SmartPROBE TM by Scientific Systems using the ‘‘Zero Second...
PLASMA PROCESSES AND POLYMERS, 2007 – Volume 4, Issue S1 , Pages S424 - S429doi.wiley.com
... [12] The electron density ne and temperature Te were determined using a Langmuir probe (Smartprobe system manufactured by Scientific Systems). ...
Positive sheath behaviour in low pressure Argon plasma -
L Schiesko, M Carrère, G Cartry, JM Layet –
Journal of Nuclear Materials Volumes 363-365, 15 June 2007, Pages 1016-1020 – Elsevier
... Baratron gauge. We use a Langmuir probe from Scientific System (Smart Probe)
to measure electronic density and temperature. Our mass ...
Probe diagnostics of argon-oxygen-tetramethyltin capacitively coupled plasmas for the deposition of tin oxide thin films… -
J Pulpytel, W Morscheidt, F Arefi-Khonsari –
Journal of Applied Physics, 2007 101 073308 (2007) 6 pages link.aip.org
... An RF compensated Langmuir probe from Scientific Systems (Smartprobe) was positioned parallel to the electrodes in the middle of the discharge. ...
Argon/tetramethysilane PECVD: From process diagnostic and modelling to a-Si: C: H hard coating composition…
A Soum-Glaude, L Thomas, A Dollet, P Ségur, MC
Diamond and Related Materials Volume 16, Issues 4-7, April-July 2007, Pages 1259-1263 Elsevier
... To quantify electron concentration (N e) and temperature (T e) in the plasma,
EP measurements (Smartprobe, Scientific System) were carried out on the ...
Plasma boundary sheath in the afterglow of a pulsed inductively coupled RF plasma
ZL Petrovic, MM Turner, T Gans, U Czarnetzki .
Plasma Sources Science and Technology. 16 (2007) pages 355---363 - iop.org
... measurements. A Langmuir probe system (Smart Probe, Scientific Systems) [36]
is installed and allows temporally resolved measurements. ...
Modes of rf capacitive discharge in low-pressure sulfur hexafluoride
V Lisovskiy, JP Booth, J Jolly, S Martins, K …
Journal of Physics D: Applied Physics, 40 6989-6999, 2007 iop.org...
Electrode surface. The Langmuir probe (SmartProbe from Scientific Systems)
was RF compensated at 13.56MHz. The compensation electrode ...
Optical absorption and emission spectroscopy studies of ammonia-containing plasmas
SJ Kang, VM Donnelly –
Plasma Sources Science and Technology, 16 265-272 2007 - iop.org
... Absorption and emission spectra were recorded as a function of plasma power and
substrate stage temperature. A Langmuir probe (Scientific Systems Smart Probe ...
Transition phenomena in a radio-frequency inductively coupled plasma
M Abdel-Rahman, V Schulz-von der Gathen, T Gans –
Journal of Physics D: Applied Physics, 40 1678-1683, 2007 - iop.org
The discussion above is supported by Langmuir-probe (Scientific Systems, Smart-probe)
measurements as shown in figure 9 taken in the centre of the discharge...
Investigation of a radio-frequency inductive-coupled-plasma discharge afterglow in noble gases
CA DeJoseph, VI Demidov, J Blessington, ME Koepke –
Journal of Physics B: Atomic, Molecular and Optical Physics, 40(2007) pages 3823--3833 - iop.org
The Langmuir probe (Scientific Systems’ Smart Probe) with boxcar averaging capability
is triggered by a delayed pulse from the rf pulse so that by sweeping...
PLASMA PROCESSES AND POLYMERS, Volume 4, Issue S1 , Pages S330 - S335 2007 - doi.wiley.com
mTorr. An RF compensated Smartprobe from Scientific Systems was used to
determine the electron temperature and density. The details...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces and Films , November 2007 -- Volume 25, Issue 6, pp. 1524-1528 - link.aip.org
films has become attractive to the scientific community with a ... Especially the
Ti–Si–N system has been ... rf power using a commercial probe (SmartProbe) and an ...
About the EDF formation in a capacitively coupled argon plasma
M Tatanova, G Thieme, R Basner, M Hannemann, YB …
Plasma Sources Science and Technology, 15 pages 507-516 2006 - iop.org
... of the capacitively coupled rf discharge were obtained by the Langmuir probe measuring
system SmartProbe, manufactured by the Scientific Systems Company. ...
Transport of ionized metal atoms in high-power pulsed magnetron discharges assisted by inductively …
S Konstantinidis, JP Dauchot, M Ganciu, M Hecq –
Applied Physics Letters, 88, 021501 (2006) (3 pages) link.aip.org
... This last value is one order of magnitude greater than that obtained with the rf
coil using an rf-compensated Langmuir probe (SmartProbe, Scientific Systems Ltd.
PIC-MCC Model of a Plasma in the Vicinity of a Cylindrical Langmuir Probe
F Soberon –
Contributions to Plasma Physics, Volume 46, Issue 5-6 , Pages 433 – 438 2006 - doi.wiley.com
... For example, Scientific Systems SmartProbe uses Laframboise theory [6] combined
with optional thermal or Bohm current factors to fit and analyse experimental ..
Review of Scientific Instruments, - 77, 033501 (2006) (6 pages)- link.aip.org
A Scientific Systems (SmartProbe) cylindrical Langmuir probe (LP) was installed
in the plasma reactor to determine the plasma parameters. ...
Review of Scientific Instruments, 77, 116104 (2006) (2 pages) - link.aip.org
Helium pressure is. The EEDF measurements were taken at after the power interruption
using a commercial probe system SmartPROBE™ (Scientific Systems Ltd.). ...
Study of the transport of titanium neutrals and ions in the post-discharge of a high power pulsed magnetron sputtering device… -
L de Poucques, JC Imbert, C Boisse-Laporte, J … -
Plasma Sources Science and Technology, 15 pages 661-669, 2006 - iop.org
... The electron density n e and the electron temperature T e were determined using
a Langmuir probe (Smartprobe system manufactured by Scientific Systems). ...
Electrical and optical experimental study of ionized physical vapour deposition (IPVD) processes
L de Poucques, JC Imbert, C Boisse-Laporte, J … -
Czechoslovak Journal of Physics, Volume 56, Supplement 2 / October, 2006 Pages B1300---B1313 – Springer
... The electron density n e and the electron temperature T e were determined using
a Langmuir probe (Smartprobe system manufactured by Scientific Systems). The ...
Ion bombardment effects on nucleation of sputtered Mo nano-crystals in Mo/B4C/Si multilayers -
A Patelli, V Rigato, G Salmaso, NJM Carvalho, JTM …
Surface and Coatings Technology Volume 201, Issues 1-2, 12 September 2006, Pages 143-147 Elsevier
... and plasma potential (V p) measurements were carried out by a cylindrical Langmuir
probe suited for RF plasma diagnostics (Scientific Systems SmartProbe™). ...
Japanese Journal of Applied Physics Vol. 45, No. 10A, 2006, pp. 7866-7870 jjap.ipap.jp
The film thickness was approximately 600 nm. A single probe (SmartProbe,
Scientific System) was used to monitor the plasma. Film...
Plasma and ion beam characterization by non-conventional methods
H Kersten, R Wiese, M Hannemann, A Kapitov, F … -
Surface and Coatings Technology Volume 200, Issues 1-4, 1 October 2005, Pages 809-813 Elsevier
The same hole in the plasma ion beam source has also been used for Langmuir-probe
measurements (Smart probe, Scientific Systems) and optical emission ...
Review of Scientific Instruments, 2005, 76, 086105 (2005) (3 pages) - link.aip.org
In this note the method has been used for calibration of the SmartPROBE™ (Scientific
Systems Ltd). A diode, 1N989B, was used as element in Fig. . ...
Energy analysis of hyperthermal hydrogen atoms generated through surface neutralisation of ions
T. Babkina, T. Gans and U. Czarnetzki 2005
Europhys. Lett. 72 pages 235-241 - iop.org
... A commercial Langmuir probe system (Scientific Systems, Smart Probe) has been used
for spatially resolved measurements of the plasma density and the electron ...
Characterization of stationary and pulsed inductively coupled RF discharges for plasma sterilization –
T Schwarz-Selinger, H Halfmann, P Awakowicz
2005 Plasma Phys. Control. Fusion 47 A353-A360 - iop.org
A commercial Langmuir-probe system (Scientific Systems, Smart Probe) allowing
time resolved measurements is also installed. 3. Results ...
Dry etching of SiC in inductively coupled Cl/Ar plasma
L Jiang, NOV Plank, MA Blauw, R Cheung, E Drift –
Journal of Physics D Applied Physics, 2004 37 pages 1809-1814 - iop.org
from −90C to 160C. A LP (Scientific Systems Smart Probe) has been used
to characterize the plasma. The probe submersed in the ...
Review of Scientific Instruments, February 2004 -- Volume 75, Issue 2, pp. 355-359 link.aip.org
potential. A SmartProbe™ with auto-linear drive mechanism from Scientific
Systems was mounted on the laser inlet port of the source. ...
Older Citations
1. Diagnostic studies of aluminium etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage
M.V. Malyshev, V.M. Donnelly, S.W. Downey, J.I. Colonell, N. Layadi
J. Vac. Sci. Technol. A, 18 (31), May/June 2000, pp. 849 - 859
2. Time-resolved plasma parameter measurements in a low-frequency rf glow discharge
Colin A. Anderson, William G. Graham, Michael B. Hopkins
Appl. Phys. Lett. 52 (10), March 7 1998, pp. 783 - 785
3. Langmuir probe measurements of the electron energy distribution function in radio-frequency plasma
John V. Scanlan, Michael B. Hopkins
J. Vac. Sci. Technol. A 10(4), July/August 1992, pp. 1207 - 1211
4. Sheath Resistance measurements in the GEC reference reactor
J.L. Kleber, L.J. Overzet
Plasma Sources Sci. Technol. 8, 1999, pp. 534 - 543
5. Highly selective SiO2 etching in inductive coupled CHF3/CH4 plasmas
L. Rolland, M-C. Peignon, Ch. Cardinaud, G. Turban
CIP '99, 12th International Colloquium on Plasma Process, pp. 117 - 119
6. Gas Species Dependent Charge Build-Up in Reactive Ion Etching
Kiyoshi Arita, Tanemasa Asano
Jpn. J. Appl. Phys. Vol. 35, 1996, pp. 6534 - 6539
7. Heating Mode Transition Induced by a magnetic field in a Capacitive rf discharge
M.M. Turner, D.A.W. Hutchinson, R.A. Doyle, M.B. Hopkins
Physical Review E, Vol. 76. Number 12 1996, pp. 2069 - 2072
8. Langmuir Probe Measurements in the Gaseous Electronics conference RF Reference Cell
M.B. Hopkins
J. Res. Natl. Inst. Stand. Technol, Vol. 100 Number 4, July - August 1995, pp. 415 - 425
9. Anomalous Sheath Heating in a Low Pressure rf Discharge in Nitrogen
M.M. Turner, M.B. Hopkins
Physical Review Letters, Vol. 69 Number 24, June 16 1992, pp. 3511 - 3514
10. Time-resolved electron energy distribution function measurements in a pulsed magnetic multipole hydrogen discharge
M.B. Hopkins, W.G. Graham
J. Appl. Phys. 69. No. 6, March 15 1991, pp. 3461 - 3466
11. Time-Resolved Electron Energy Distribution Function Measurements in a Low-Frequency r.f. Glow Discharge
M.B. Hopkins, C.A. Anderson, W.G. Graham
Europhys. Lett., 8 (2), 1989, pp. 141 - 145
12. Electron energy distribution function measurements in a magnetic multipole plasma
M.B. Hopkins, W.G. Graham
J. Phys.D:Appl. Phys.20, 1987, pp. 838 - 843
13. Langmuir Probe technique for Plasma parameter measurement in a medium density discharge
M.B. Hopkins, W.G. Graham
Rev. ScI. Instrum., Vol. 57, No. 9, 1986, pp. 2210 - 2217
14. Comparison of electron property measurements in an inductively coupled plasma made by Langmuir probe and laser Thompson scattering techniques
M.D. Bowden, M. Kogano, Y. Suetome, T. Hori, K. Uchino, K. Muraoka
J.Vac.Sci.Technol. A 17 (2), March/April 1999, pp. 493 - 499
15. Plasma Diagnosis and Charging Damage
M.V. Malyshev, V.M. Donnelly, J.I. Colonell, S. Samukawa
1999 4th International Symposium on Plasma Process-Induced Damage Proceedings, May 10-11 1999, pp. 149 - 154
16. Langmuir Probe Measurements in a low pressure inductively coupled plasma used for diamond deposition
K. Okada, S. Fomatsu, S. Matsumoto
J. Vac. Sci. Technol. A 17(3), May/June 1999
17. Langmuir Probe studies of a helicon plasma system
T.P. Schneider, W.W. Dostalik, A.D. Springfield, R. Kraft
March 18, 1999, IOP Publishing Ltd, pp. 397 - 403
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