SmartPIM Citations
Sheath Phenomena in Dusty Plasmas -
GV Paeva - 2005 –
phys.tue.nl, Doctorate Thesis, Technical University Eindhoven, Eindhoven, The Netherlands
SHEATH PHENOMENA IN DUSTY PLASMAS PROEFSCHRIFT ter verkrijging van
de graad van doctor aan de Technische Universiteit Eindhoven...
Oxide etch rate estimation using plasma impedance monitoring -
D Tsunami, J McNames, B Whitefield, P Rudolph, J … -
Proceedings. SPIE, Semiconductor Manufacturing 2005 - cecs.pdx.edu
Impedance data. The plasma impedance data was collected using Straatum SmartPIM
Plasma Impedance Monitoring devices. II. METHODOLOGY ...
Electrical and optical characterization of particle formation in an argon–silane capacitively coupled plasma …
R Ghidini, C Groothuis, M Sorokin, GMW Kroesen, WW … -
Plasma Sources Science and Technology, 13 pages 143-149 2004 - iop.org
An overview of the experimental set-up is shown in figure 2. A commercial plasma
impedance monitor, the ‘Smart PIM’ by Scientific Systems, allows ... PIM smart ...
Determination of SF6 reactive ion etching end point of the SiO2/Si system by plasma impedance monitoring …
MNA Dewan, PJ McNally, T Perova, PAF Herbert –
Microelectronic Engineering Volume 65, Issues 1-2, January 2003, Pages 25-46 Elsevier
The PIM (shown by the dotted line in Fig. 2) comprises a Scientific Systems
Smart PIM™ unit interfaced to a personal computer. ...
Plasma studies under polymorphous silicon deposition conditions
AV Kharchenko, V Suendo, P Roca i Cabarrocas –
Thin Solid Films Volume 427, Issues 1-2, 3 March 2003, Pages 236-240 Elsevier
With help of the impedance probe (Smart PIM of Scientific Systems) we can measure
the time evolution of the RF current, voltage, and impedance. ...
Experimental study of the influence of nanoparticle generation on the electrical characteristics of argon-silane capacitive radio-frequency plasmas …
Z Shen, U Kortshagen –
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films -- January 2002 -- Volume 20, Issue 1, pp. 153-159 link.aip.org
In our experiments we used a commercial plasma impedance monitor, the Smart PIM by Scientific Systems, to analyze the electrical parameters of the system. ...
Temperature dependence and silane consumption during particle formation in Ar-silane RF capacitively coupled plasma …
M Sorokin, GMW Kroesen, WW Stoffels –
Plasma Science, IEEE Transactions, April 2004 Volume: 32, Issue: 2, Part 2 On page(s): 731- 737 - ieeexplore.ieee.org
A commercial plasma impedance monitor, the “Smart PIM” by Scientific Systems,
allows the measurement of the rf current, voltage, and phase angle in a ...
Wafer-Voltage Measurement in Plasma Processes by Means of a New Probe Method and an Impedance Monitor…
S Kanno, J Tanaka, T Tetsuka, R Nishio, H Yamamoto –
Japanese Journal of Applied Physics, Vol. 43, No. 3, 2004, pp. 1199-1204 jjap.ipap.jp
... An IM (Scientific Systems Ltd. Smart PIM 14)) was installed at the exit of the
matching network to measure voltage, current, and phases shift. This IM can ...
Older Citations
1. In-Situ RF Diagnostics for PECVD Process Control
S. Raoux, K.S. Liu, X. Guo, D. Silvetti
Mat.Res.Soc.Symp.Proc.Vol. 502, 1998, pp. 53 - 58
2. "Experimental study of the influence of nanoparticle generation of the electrical characteristics of argon-silane capacitive radio-frequency plasmas"
J.Vac.Sci.Technol. A 20(1), Jan/Feb 2002
Authors: Zhe Shen and Uwe Kortshagen
